This work is partially funded by the NIST Office of Microelectronic Programs. K. J. Alvine and B. C. Okerberg acknowledge the support of the National Research Council NIST Postdoctoral Fellowship Program. We acknowledge the nanofabrication laboratory of the Center for Nanoscale Science and Technology (CNST) at NIST for providing facilities for the nanoimprint process. This work is an official contribution of the National Institute of Standards and Technology; not subject to copyright in the United States. Certain commercial materials and equipment are identified in this paper in order to specify adequately the experimental procedure. In no case does such identification imply recommendation by the National Institute of Standards and Technology nor does it imply that the material or equipment identified is necessarily the best available for this purpose. The error bars presented throughout this manuscript indicate the relative standard uncertainty of the measurement.
Nanoimprint Lithography and the Role of Viscoelasticity in the Generation of Residual Stress in Model Polystyrene Patterns†
Article first published online: 10 JUN 2008
Copyright © 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Advanced Functional Materials
Volume 18, Issue 12, pages 1854–1862, June 24, 2008
How to Cite
Ding, Y., Ro, H. W., Alvine, K. J., Okerberg, B. C., Zhou, J., Douglas, J. F., Karim, A. and Soles, C. L. (2008), Nanoimprint Lithography and the Role of Viscoelasticity in the Generation of Residual Stress in Model Polystyrene Patterns. Adv. Funct. Mater., 18: 1854–1862. doi: 10.1002/adfm.200701402
- Issue published online: 18 JUN 2008
- Article first published online: 10 JUN 2008
- Manuscript Revised: 29 JAN 2008
- Manuscript Received: 30 NOV 2007
- NIST Office of Microelectronic Programs. K. J. Alvine
- B. C. Okerberg
- National Research Council NIST Postdoctoral Fellowship Program
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