Detachment Lithography of Photosensitive Polymers: A Route to Fabricating Three-Dimensional Structures
Version of Record online: 23 OCT 2009
Copyright © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Advanced Functional Materials
Volume 20, Issue 2, pages 289–295, January 22, 2010
How to Cite
Yeom, J. and Shannon, M. A. (2010), Detachment Lithography of Photosensitive Polymers: A Route to Fabricating Three-Dimensional Structures. Adv. Funct. Mater., 20: 289–295. doi: 10.1002/adfm.200900686
- Issue online: 13 JAN 2010
- Version of Record online: 23 OCT 2009
- Manuscript Received: 20 APR 2009
- US Department of Energy. Grant Numbers: DE-FG02-07ER46453, DE-FG02-07ER46471
Options for accessing this content:
- If you are a society or association member and require assistance with obtaining online access instructions please contact our Journal Customer Services team.
- If your institution does not currently subscribe to this content, please recommend the title to your librarian.
- Login via other institutional login options http://onlinelibrary.wiley.com/login-options.
- You can purchase online access to this Article for a 24-hour period (price varies by title)
- If you already have a Wiley Online Library or Wiley InterScience user account: login above and proceed to purchase the article.
- New Users: Please register, then proceed to purchase the article.
Login via OpenAthens
Search for your institution's name below to login via Shibboleth.
Registered Users please login:
- Access your saved publications, articles and searches
- Manage your email alerts, orders and subscriptions
- Change your contact information, including your password
Please register to:
- Save publications, articles and searches
- Get email alerts
- Get all the benefits mentioned below!