Ultralow Dielectric Constant Tetravinyltetramethylcyclotetrasiloxane Films Deposited by Initiated Chemical Vapor Deposition (iCVD)
Article first published online: 14 JAN 2010
Copyright © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Advanced Functional Materials
Volume 20, Issue 4, pages 607–616, February 22, 2010
How to Cite
Trujillo, N. J., Wu, Q. and Gleason, K. K. (2010), Ultralow Dielectric Constant Tetravinyltetramethylcyclotetrasiloxane Films Deposited by Initiated Chemical Vapor Deposition (iCVD). Adv. Funct. Mater., 20: 607–616. doi: 10.1002/adfm.200900999
- Issue published online: 12 FEB 2010
- Article first published online: 14 JAN 2010
- Manuscript Revised: 4 OCT 2009
- Manuscript Received: 5 JUN 2009
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