Reactive Imprint Lithography: Combined Topographical Patterning and Chemical Surface Functionalization of Polystyrene-block-poly(tert-butyl acrylate) Films
Article first published online: 28 DEC 2009
Copyright © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Advanced Functional Materials
Volume 20, Issue 3, pages 460–468, February 8, 2010
How to Cite
Duvigneau, J., Cornelissen, S., Bardají Valls, N., Schönherr, H. and Vancso, G. J. (2010), Reactive Imprint Lithography: Combined Topographical Patterning and Chemical Surface Functionalization of Polystyrene-block-poly(tert-butyl acrylate) Films. Adv. Funct. Mater., 20: 460–468. doi: 10.1002/adfm.200901736
- Issue published online: 27 JAN 2010
- Article first published online: 28 DEC 2009
- Manuscript Revised: 30 OCT 2009
- Manuscript Received: 14 SEP 2009
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