Full Paper
Patterned Synthesis of Pd4S: Chemically Robust Electrodes and Conducting Etch Masks
Article first published online: 17 FEB 2010
DOI: 10.1002/adfm.200901766
Copyright © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Additional Information
How to Cite
Radha, B. and Kulkarni, G. U. (2010), Patterned Synthesis of Pd4S: Chemically Robust Electrodes and Conducting Etch Masks. Adv. Funct. Mater., 20: 879–884. doi: 10.1002/adfm.200901766
Publication History
- Issue published online: 22 MAR 2010
- Article first published online: 17 FEB 2010
- Manuscript Revised: 30 OCT 2009
- Manuscript Received: 17 SEP 2009
Keywords:
- Lithography;
- Palladium sulfides;
- Electrodes;
- Patterning
Abstract
A simple, one-step process to synthesize Pd4S films is reported here along with their characterization using X-ray diffraction, electron microscopy, and electrical measurements. The synthesis involves thermolysis of a single-source precursor, namely palladium alkanethiolate, in H2 atmosphere at 250 °C for 3 h. The films are highly conducting and resistant to strong acidic, alkali, and oxidizing environments. The precursor allows patterning of the Pd4S films by electron beam lithography and micromolding, an attribute that has been employed in making chemically resistant electrodes and etch masks. The conversion of palladium thiolate to other sulfide phases is also achieved.

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