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Patterned Synthesis of Pd4S: Chemically Robust Electrodes and Conducting Etch Masks

Authors

  • Boya Radha,

    1. Chemistry and Physics of Materials Unit and DST Unit on Nanoscience Jawaharlal Nehru Centre for Advanced Scientific Research Jakkur P.O., Bangalore 560 064 (India)
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  • Giridhar U. Kulkarni

    Corresponding author
    1. Chemistry and Physics of Materials Unit and DST Unit on Nanoscience Jawaharlal Nehru Centre for Advanced Scientific Research Jakkur P.O., Bangalore 560 064 (India)
    • Chemistry and Physics of Materials Unit and DST Unit on Nanoscience Jawaharlal Nehru Centre for Advanced Scientific Research Jakkur P.O., Bangalore 560 064 (India).
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Abstract

A simple, one-step process to synthesize Pd4S films is reported here along with their characterization using X-ray diffraction, electron microscopy, and electrical measurements. The synthesis involves thermolysis of a single-source precursor, namely palladium alkanethiolate, in H2 atmosphere at 250 °C for 3 h. The films are highly conducting and resistant to strong acidic, alkali, and oxidizing environments. The precursor allows patterning of the Pd4S films by electron beam lithography and micromolding, an attribute that has been employed in making chemically resistant electrodes and etch masks. The conversion of palladium thiolate to other sulfide phases is also achieved.

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