Integration of Density Multiplication in the Formation of Device-Oriented Structures by Directed Assembly of Block Copolymer–Homopolymer Blends

Cited in:

CrossRef

This article has been cited by:

1. 1
   Nathanael L. Y. Wu, Kenneth D. Harris, Jillian M. Buriak, Conversion of Bilayers of PS-b-PDMS Block Copolymer into Closely Packed, Aligned Silica Nanopatterns, ACS Nano, 2013, 130515141918009

   CrossRef

2. 2
   G. Liu, D. J. Eichelsdoerfer, B. Rasin, Y. Zhou, K. A. Brown, X. Liao, C. A. Mirkin, Delineating the pathways for the site-directed synthesis of individual nanoparticles on surfaces, Proceedings of the National Academy of Sciences, 2013, 110, 3, 887

   CrossRef

3. 3
   Mikihito Takenaka, Hirokazu Hasegawa, Directed self-assembly of block copolymers, Current Opinion in Chemical Engineering, 2013, 2, 1, 88

   CrossRef

4. 4
   Peng Chen, Haojun Liang, Ru Xia, Jiasheng Qian, Xiaoshuang Feng, Directed Self-Assembly of Block Copolymers on Sparsely Nanopatterned Substrates, Macromolecules, 2013, 46, 3, 922

   CrossRef

5. 5
   Guoliang Liu, Yu Zhou, Resham S. Banga, Radha Boya, Keith A. Brown, Anthony J. Chipre, SonBinh T. Nguyen, Chad A. Mirkin, The role of viscosity on polymer ink transport in dip-pen nanolithography, Chemical Science, 2013, 4, 5, 2093

   CrossRef

6. 6
   Huiman Kang, Gordon S. W. Craig, Eungnak Han, Padma Gopalan, Paul F. Nealey, Degree of Perfection and Pattern Uniformity in the Directed Assembly of Cylinder-Forming Block Copolymer on Chemically Patterned Surfaces, Macromolecules, 2012, 45, 1, 159

   CrossRef

7. 7
   Shengxiang Ji, Umang Nagpal, Guoliang Liu, Sean P. Delcambre, Marcus Müller, Juan J. de Pablo, Paul F. Nealey, Directed Assembly of Non-equilibrium ABA Triblock Copolymer Morphologies on Nanopatterned Substrates, ACS Nano, 2012, 6, 6, 5440

   CrossRef

8. 8
   Yasuhiko Tada, Hiroshi Yoshida, Yoshihito, Ishida, Tomoyasu Hirai, Joan K. Bosworth, Elizabeth Dobisz, Ricardo Ruiz, Mikihito Takenaka, Teruaki Hayakawa, Hirokazu Hasegawa, Directed Self-Assembly of POSS Containing Block Copolymer on Lithographically Defined Chemical Template with Morphology Control by Solvent Vapor, Macromolecules, 2012, 45, 1, 292

   CrossRef

9. 9
   Zhenyu Chu, Lei Shi, Lifang Liu, Yu Liu, Wanqin Jin, Highly enhanced performance of glucose biosensor via in situ growth of oriented Au micro-cypress, Journal of Materials Chemistry, 2012, 22, 41, 21917

   CrossRef

10. 10
    Sean P. Delcambre, Shengxiang Ji, Paul F. Nealey, Mechanical properties of polymeric nanostructures fabricated through directed self-assembly of symmetric diblock and triblock copolymers, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2012, 30, 6, 06F204

    CrossRef

11. 11
    Guoliang Liu, Abelardo Ramírez-Hernández, Hiroshi Yoshida, Kim Nygård, Dillip K. Satapathy, Oliver Bunk, Juan J. de Pablo, Paul F. Nealey, Morphology of Lamellae-Forming Block Copolymer Films between Two Orthogonal Chemically Nanopatterned Striped Surfaces, Physical Review Letters, 2012, 108, 6

    CrossRef

12. 12
    Ian P. Campbell, Gawain J. Lau, Jonathan L. Feaver, Mark P. Stoykovich, Network Connectivity and Long-Range Continuity of Lamellar Morphologies in Block Copolymer Thin Films, Macromolecules, 2012, 45, 3, 1587

    CrossRef

13. 13
    Guoliang Liu, François Detcheverry, Abelardo Ramírez-Hernández, Hiroshi Yoshida, Yasuhiko Tada, Juan J. de Pablo, Paul F. Nealey, Nonbulk Complex Structures in Thin Films of Symmetric Block Copolymers on Chemically Nanopatterned Surfaces, Macromolecules, 2012, 45, 9, 3986

    CrossRef

14. 14
    Richard G. Hobbs, Nikolay Petkov, Justin D. Holmes, Semiconductor Nanowire Fabrication by Bottom-Up and Top-Down Paradigms, Chemistry of Materials, 2012, 24, 11, 1975

    CrossRef

15. 15
    Abelardo Ramírez-Hernández, Guoliang Liu, Paul F. Nealey, Juan J. de Pablo, Symmetric Diblock Copolymers Confined by Two Nanopatterned Surfaces, Macromolecules, 2012, 45, 5, 2588

    CrossRef

16. 16
    Yu-Chih Tseng, Qing Peng, Leonidas E. Ocola, Jeffrey W. Elam, Seth B. Darling, Enhanced Block Copolymer Lithography Using Sequential Infiltration Synthesis, The Journal of Physical Chemistry C, 2011, 115, 36, 17725

    CrossRef

17. 17
    Guoliang Liu, Paul F. Nealey, Ricardo Ruiz, Elizabeth Dobisz, Kanaiyalal C. Patel, Thomas R. Albrecht, Fabrication of chevron patterns for patterned media with block copolymer directed assembly, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2011, 29, 6, 06F204

    CrossRef

18. 18
    Chi-Chun Liu, Eungnak Han, M. Serdar Onses, Christopher J. Thode, Shengxiang Ji, Padma Gopalan, Paul F. Nealey, Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats, Macromolecules, 2011, 44, 7, 1876

    CrossRef

19. 19
    Raluca Tiron, Xavier Chevalier, Christophe Couderc, Jonathan Pradelles, Jessy Bustos, Laurent Pain, Christophe Navarro, Stephanie Magnet, Guillaume Fleury, Georges Hadziioannou, Optimization of block copolymer self-assembly through graphoepitaxy: A defectivity study, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2011, 29, 6, 06F206

    CrossRef

20. 20
    D Borah, M T Shaw, S Rasappa, R A Farrell, C O'Mahony, C M Faulkner, M Bosea, P Gleeson, J D Holmes, M A Morris, Plasma etch technologies for the development of ultra-small feature size transistor devices, Journal of Physics D: Applied Physics, 2011, 44, 17, 174012

    CrossRef

21. 21
    M. Serdar Onses, Christopher J. Thode, Chi-Chun Liu, Shengxiang Ji, Peter L. Cook, Franz J. Himpsel, Paul F. Nealey, Site-Specific Placement of Au Nanoparticles on Chemical Nanopatterns Prepared by Molecular Transfer Printing Using Block-Copolymer Films, Advanced Functional Materials, 2011, 21, 16

    Direct Link:

    • Abstract
    • Full Article (HTML)
    • PDF(901K)
    • References
22. 22
    Mikihito Takenaka, Shusuke Aburaya, Satoshi Akasaka, Hirokazu Hasegawa, Nikos Hadjichristidis, George Sakellariou, Yasuhiko Tada, Hiroshi Yoshida, Formation of long-range stripe patterns with sub-10-nm half-pitch from directed self-assembly of block copolymer, Journal of Polymer Science Part B: Polymer Physics, 2010, 48, 22

    Direct Link:

    • Abstract
    • Full Article (HTML)
    • PDF(476K)
    • References
23. 23
    Guoliang Liu, Sean P. Delcambre, Karl O. Stuen, Gordon S. W. Craig, Juan J. de Pablo, Paul F. Nealey, Kim Nygård, Dillip K. Satapathy, Oliver Bunk, Harun H. Solak, Mechanism and dynamics of block copolymer directed assembly with density multiplication on chemically patterned surfaces, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2010, 28, 6, C6B13

    CrossRef