Near-Field Lithography by Two-Photon Induced Photocleavage of Organic Monolayers
Version of Record online: 15 OCT 2010
Copyright © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Advanced Functional Materials
Volume 20, Issue 24, pages 4265–4272, December 21, 2010
How to Cite
Álvarez, M., Best, A., Unger, A., Alonso, J. M., del Campo, A., Schmelzeisen, M., Koynov, K. and Kreiter, M. (2010), Near-Field Lithography by Two-Photon Induced Photocleavage of Organic Monolayers. Adv. Funct. Mater., 20: 4265–4272. doi: 10.1002/adfm.201000939
- Issue online: 15 DEC 2010
- Version of Record online: 15 OCT 2010
- Manuscript Received: 11 MAY 2010
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