Structural and Electrical Properties of Atomic Layer Deposited Al-Doped ZnO Films
Article first published online: 10 NOV 2010
Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Advanced Functional Materials
Volume 21, Issue 3, pages 448–455, February 8, 2011
How to Cite
Lee, D.-J., Kim, H.-M., Kwon, J.-Y., Choi, H., Kim, S.-H. and Kim, K.-B. (2011), Structural and Electrical Properties of Atomic Layer Deposited Al-Doped ZnO Films. Adv. Funct. Mater., 21: 448–455. doi: 10.1002/adfm.201001342
- Issue published online: 4 FEB 2011
- Article first published online: 10 NOV 2010
- Manuscript Revised: 8 SEP 2010
- Manuscript Received: 2 JUL 2010
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