SEARCH

SEARCH BY CITATION

Keywords:

  • electron-beam nanolithography;
  • hydrogen reduction;
  • line-width roughness;
  • metal-organic materials
Thumbnail image of graphical abstract

This computer rendered graphic displays direct writing of sub-10 nm metallic wires of low line-width roughness using an electron beam (shown as a sinusoidal wave), as presented by M. S. M. Saifullah, D. J. Kang, U. Steiner, et al. on page 2317. Sub-10 nm metallic wires of good integrity and low line-width roughness were obtained by reducing electron-beam patterned metal naphthenate lines in a hydrogen-rich atmosphere at 500°C for 1 h.