A Nanoimprint Lithography Hybrid Photoresist Based on the Thiol–Ene System
Article first published online: 3 JUN 2011
Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Advanced Functional Materials
Volume 21, Issue 15, pages 2960–2967, August 9, 2011
How to Cite
Lin, H., Wan, X., Jiang, X., Wang, Q. and Yin, J. (2011), A Nanoimprint Lithography Hybrid Photoresist Based on the Thiol–Ene System. Adv. Funct. Mater., 21: 2960–2967. doi: 10.1002/adfm.201100692
- Issue published online: 4 AUG 2011
- Article first published online: 3 JUN 2011
- Manuscript Received: 29 MAR 2011
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