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Nonstick, Modulus-Tunable and Gas-Permeable Replicas for Mold-Based, High-Resolution Nanolithography

Authors

  • Bong Kuk Lee,

    1. IT Convergence Technology Research Laboratory, Electronics & Telecommunications Research Institute (ETRI), 218 Gajeongno, Yuseong, Daejeon, 305-700, Korea
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  • Hyunmin Cho,

    1. BioNanotechnology Research Center, Korea Research Institute of Bioscience & Biotechnology (KRIBB), 111 Gwahangno, Yuseong-gu, Daejeon, 305-806, Korea
    2. Nanobiotechnology, School of Engineering, University of Science and Technology (UST), 217 Gajungro, Yuseong-gu, Daejeon, 305-600, Korea
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  • Bong Hyun Chung

    Corresponding author
    1. BioNanotechnology Research Center, Korea Research Institute of Bioscience & Biotechnology (KRIBB), 111 Gwahangno, Yuseong-gu, Daejeon, 305-806, Korea
    2. Nanobiotechnology, School of Engineering, University of Science and Technology (UST), 217 Gajungro, Yuseong-gu, Daejeon, 305-600, Korea
    • BioNanotechnology Research Center, Korea Research Institute of Bioscience & Biotechnology (KRIBB), 111 Gwahangno, Yuseong-gu, Daejeon, 305-806, Korea.
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Abstract

A fundamental approach to fabricating a nonstick replica mold with high performance for the manufacturing of high-resolution nanostructures using mold-based lithography is presented. Low-viscosity liquid blends consisting of methacrylate multi-functionalized silsesquioxane (SSQMA), difunctional acrylics, and a small amount of silicone diacrylate (Si-DA) with low surface tension were used as nonstick replica-mold materials. The cured SSQMA/acrylic/Si-DA networks showed a high resistance to organic solvents (<1.2 wt.%), high UV transparency (>90% at 365 nm), hydrophobicity (water contact angle >90°), high modulus and wide-range modulus tunability (0.6–4.42 GPa) and small shrinkage (<3% in height). The mold materials with a nonstick property conferred by Si-DA possessed the ability to form sub-25-nm features with a high line-to-space ratio (1:1) and a high aspect ratio (4:1). In addition, a sufficiently cured replica mold with a low concentration of residual, uncross-linked (meth)acrylates was able to successfully replicate sub-25-nm features with a high line-to-space ratio (1:1) and a high aspect ratio (4:1), even if the release agent was not modified. Furthermore, replica molds can potentially be used to fabricate patterns free of bubble defects because of sufficient gas permeability.

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