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Triangular Elastomeric Stamps for Optical Applications: Near-Field Phase Shift Photolithography, 3D Proximity Field Patterning, Embossed Antireflective Coatings, and SERS Sensing

  1. Audrey M. Bowen1,
  2. Michael J. Motala1,
  3. J. Matthew Lucas2,
  4. Sidhartha Gupta3,
  5. Alfred J. Baca4,
  6. Agustin Mihi5,
  7. A. Paul Alivisatos6,
  8. Paul V. Braun3,
  9. Ralph G. Nuzzo1,*

Article first published online: 12 APR 2012

DOI: 10.1002/adfm.201102455

Issue

Advanced Functional Materials

Advanced Functional Materials

Volume 22, Issue 14, pages 2927–2938, July 24, 2012

Additional Information

How to Cite

Bowen, A. M., Motala, M. J., Lucas, J. M., Gupta, S., Baca, A. J., Mihi, A., Alivisatos, A. P., Braun, P. V. and Nuzzo, R. G. (2012), Triangular Elastomeric Stamps for Optical Applications: Near-Field Phase Shift Photolithography, 3D Proximity Field Patterning, Embossed Antireflective Coatings, and SERS Sensing. Adv. Funct. Mater., 22: 2927–2938. doi: 10.1002/adfm.201102455

Author Information

  1. 1

    Department of Chemistry, Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL 61801, USA

  2. 2

    Department of Mechanical Engineering, University of California at Berkeley, Berkeley, CA 94720, USA

  3. 3

    Department of Materials Science and Engineering, Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL 61801, USA

  4. 4

    U.S. Navy NAVAIR-NAWCWD, Research and Intelligence Department, Chemistry Branch, China Lake, CA 93555, USA

  5. 5

    Beckman Institute for Advanced Science and Technology, University of Illinois at Urbana-Champaign, Urbana, IL 61801, USA

  6. 6

    Department of Chemistry, University of California at Berkeley, Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA

*Department of Chemistry, Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL 61801, USA.

Publication History

  1. Issue published online: 11 JUL 2012
  2. Article first published online: 12 APR 2012
  3. Manuscript Revised: 23 JAN 2012
  4. Manuscript Received: 11 OCT 2011

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Keywords:

  • polydimethylsiloxane;
  • embossing;
  • proximity field nanopatterning;
  • phase shift lithography;
  • surface-enhanced Raman spectroscopy;
  • antireflective coatings

Abstract

The use of a decal transfer lithography technique to fabricate elastomeric stamps with triangular cross-sections, specifically triangular prisms and cones, is described. These stamps are used in demonstrations for several prototypical optical applications, including the fabrication of multiheight 3D photoresist patterns with near zero-width features using near-field phase shift lithography, fabrication of periodic porous polymer structures by maskless proximity field nanopatterning, embossing thin-film antireflection coatings for improved device performance, and efficient fabrication of substrates for surface-enhanced Raman spectroscopic sensing. The applications illustrate the utility of the triangular poly(dimethylsiloxane) decals for a wide variety of optics-centric applications, particularly those that exploit the ability of the designed geometries and materials combinations to manipulate light–matter interactions in a predictable and controllable manner.

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