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Triangular Elastomeric Stamps for Optical Applications: Near-Field Phase Shift Photolithography, 3D Proximity Field Patterning, Embossed Antireflective Coatings, and SERS Sensing

Authors

  • Audrey M. Bowen,

    1. Department of Chemistry, Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL 61801, USA
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  • Michael J. Motala,

    1. Department of Chemistry, Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL 61801, USA
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  • J. Matthew Lucas,

    1. Department of Mechanical Engineering, University of California at Berkeley, Berkeley, CA 94720, USA
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  • Sidhartha Gupta,

    1. Department of Materials Science and Engineering, Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL 61801, USA
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  • Alfred J. Baca,

    1. U.S. Navy NAVAIR-NAWCWD, Research and Intelligence Department, Chemistry Branch, China Lake, CA 93555, USA
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  • Agustin Mihi,

    1. Beckman Institute for Advanced Science and Technology, University of Illinois at Urbana-Champaign, Urbana, IL 61801, USA
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  • A. Paul Alivisatos,

    1. Department of Chemistry, University of California at Berkeley, Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA
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  • Paul V. Braun,

    1. Department of Materials Science and Engineering, Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL 61801, USA
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  • Ralph G. Nuzzo

    Corresponding author
    1. Department of Chemistry, Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL 61801, USA
    • Department of Chemistry, Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL 61801, USA.
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Abstract

The use of a decal transfer lithography technique to fabricate elastomeric stamps with triangular cross-sections, specifically triangular prisms and cones, is described. These stamps are used in demonstrations for several prototypical optical applications, including the fabrication of multiheight 3D photoresist patterns with near zero-width features using near-field phase shift lithography, fabrication of periodic porous polymer structures by maskless proximity field nanopatterning, embossing thin-film antireflection coatings for improved device performance, and efficient fabrication of substrates for surface-enhanced Raman spectroscopic sensing. The applications illustrate the utility of the triangular poly(dimethylsiloxane) decals for a wide variety of optics-centric applications, particularly those that exploit the ability of the designed geometries and materials combinations to manipulate light–matter interactions in a predictable and controllable manner.

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