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Keywords:

  • directional photofluidization;
  • azopolymer;
  • polarization-dependence;
  • line-edge roughness;
  • hierarchical structures
Thumbnail image of graphical abstract

A principal challenge in nanopatterning is to beat the resolution limit of established methods. On page 1770, Seungwoo Lee, Hong Suk Kang, and Jung-Ki Park present the directional photofluidization of azopolymers, which allows the generation of large-area, highly ordered nanoarchitectures with precisely controlled structural features. Additionally, this approach can offer unprecedented flexibility in control of the final feature size, and, simultaneously, its fluidic behavior under light irradiation signifi cantly reduces the line-edge roughness