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Using Directed Self Assembly of Block Copolymer Nanostructures to Modulate Nanoscale Surface Roughness: Towards a Novel Lithographic Process
Article first published online: 22 AUG 2012
DOI: 10.1002/adfm.201200564
Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
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How to Cite
Chuang, Y.-M., Jack, K. S., Cheng, H.-H., Whittaker, A. K. and Blakey, I. (2013), Using Directed Self Assembly of Block Copolymer Nanostructures to Modulate Nanoscale Surface Roughness: Towards a Novel Lithographic Process. Adv. Funct. Mater., 23: 173–183. doi: 10.1002/adfm.201200564
Publication History
- Issue published online: 6 JAN 2013
- Article first published online: 22 AUG 2012
- Manuscript Revised: 18 JUN 2012
- Manuscript Received: 27 FEB 2012
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