High Contrast Superlens Lithography Engineered by Loss Reduction
Article first published online: 23 MAY 2012
Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Advanced Functional Materials
Volume 22, Issue 18, pages 3777–3783, September 25, 2012
How to Cite
Liu, H., Wang, B., Ke, L., Deng, J., Choy, C. C., Zhang, M. S., Shen, L., Maier, S. A. and Teng, J. H. (2012), High Contrast Superlens Lithography Engineered by Loss Reduction. Adv. Funct. Mater., 22: 3777–3783. doi: 10.1002/adfm.201200788
- Issue published online: 18 SEP 2012
- Article first published online: 23 MAY 2012
- Manuscript Received: 21 MAR 2012
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