Direct Photopatterning of Electrochromic Polymers

Authors

  • Jacob Jensen,

    1. Department of Energy Conversion and Storage, Technical University of Denmark, Frederiksborgvej 399, DK-4000 Roskilde, Denmark
    Search for more papers by this author
  • Aubrey L. Dyer,

    Corresponding author
    1. School of Chemistry and Biochemistry and School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, GA 30332, USA
    • School of Chemistry and Biochemistry and School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, GA 30332, USA.
    Search for more papers by this author
  • D. Eric Shen,

    1. School of Chemistry and Biochemistry and School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, GA 30332, USA
    Search for more papers by this author
  • Frederik C. Krebs,

    1. Department of Energy Conversion and Storage, Technical University of Denmark, Frederiksborgvej 399, DK-4000 Roskilde, Denmark
    Search for more papers by this author
  • John R. Reynolds

    1. School of Chemistry and Biochemistry and School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, GA 30332, USA
    Search for more papers by this author

Abstract

Propylenedioxythiophene (ProDOT) polymers are synthesized using an oxidative polymerization route that results in methacrylate substituted poly(ProDOTs) having a Mn of 10–20 kDa wherein the methacrylate functionality constitutes from 6 to 60% of the total monomer units. Solutions of these polymers show excellent film forming abilities, with thin films prepared using both spray-casting and spin-coating. These polymers are demonstrated to crosslink upon UV irradiation at 350 nm, in the presence of an appropriate photoinitiator, to render the films insoluble to common organic solvents. Electrochemical, spectroelectrochemical, and colorimetric analyses of the crosslinked polymer films are performed to establish that they retain the same electrochromic qualities as the parent polymers with no detriment to the observed properties. To demonstrate applicability for multi-film processing and patterning, photolithographic patterning is shown, as is desired for fully solution processed and patterned devices.

Ancillary