Photochemical Generation of Light Responsive Surfaces

Authors

  • Eva Blasco,

    1. Instituto de Ciencia de Materiales de Aragón (ICMA), Universidad de Zaragoza-CSIC, Departamento de Química Orgánica, Facultad de Ciencias, 50009 Zaragoza, Spain
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  • Milagros Piñol,

    1. Instituto de Ciencia de Materiales de Aragón (ICMA), Universidad de Zaragoza-CSIC, Departamento de Química Orgánica, Facultad de Ciencias, 50009 Zaragoza, Spain
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  • Luis Oriol,

    Corresponding author
    1. Instituto de Ciencia de Materiales de Aragón (ICMA), Universidad de Zaragoza-CSIC, Departamento de Química Orgánica, Facultad de Ciencias, 50009 Zaragoza, Spain
    • Instituto de Ciencia de Materiales de Aragón (ICMA), Universidad de Zaragoza-CSIC, Departamento de Química Orgánica, Facultad de Ciencias, 50009 Zaragoza, Spain
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  • Bernhard V. K. J. Schmidt,

    1. Preparative Macromolecular Chemistry, Institut für Technische Chemie und Polymerchemie, Karlsruhe Institute of Technology (KIT), 76128 Karlsruhe, and Soft Matter Synthesis Laboratory, Institute for Biological Interfaces (IBG I), Karlsruhe Institute of Technology (KIT), 76344 Eggenstein-Leopoldshafen, Germany
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  • Alexander Welle,

    1. Institute for Biological Interfaces (IBG I), Karlsruhe Institute of Technology (KIT), 76344 Eggenstein-Leopoldshafen, Germany
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  • Vanessa Trouillet,

    1. Institute for Applied Materials (IAM-ESS) and Karlsruhe Nano Micro Facility (KNMF), Karlsruhe Institute of Technology (KIT), 76344 Eggenstein-Leopoldshafen, Germany
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  • Michael Bruns,

    1. Institute for Applied Materials (IAM-ESS) and Karlsruhe Nano Micro Facility (KNMF), Karlsruhe Institute of Technology (KIT), 76344 Eggenstein-Leopoldshafen, Germany
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  • Christopher Barner-Kowollik

    Corresponding author
    1. Preparative Macromolecular Chemistry, Institut für Technische Chemie und Polymerchemie, Karlsruhe Institute of Technology (KIT), 76128 Karlsruhe, and Soft Matter Synthesis Laboratory, Institute for Biological Interfaces (IBG I), Karlsruhe Institute of Technology (KIT), 76344 Eggenstein-Leopoldshafen, Germany
    • Preparative Macromolecular Chemistry, Institut für Technische Chemie und Polymerchemie, Karlsruhe Institute of Technology (KIT), 76128 Karlsruhe, and Soft Matter Synthesis Laboratory, Institute for Biological Interfaces (IBG I), Karlsruhe Institute of Technology (KIT), 76344 Eggenstein-Leopoldshafen, Germany.
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Abstract

The preparation of patterned photoswitchable surfaces by employing the nitrile imine-mediated tetrazole ene cycloaddition (NITEC) photoinduced reaction in the presence of dipolarophiles based on photoresponsive azobenzene moieties is reported. The dipolarophile used is a maleimide carrying either an azobenzene unit or a first generation dendron containing two azobenzene units. X-ray photoelectron spectroscopy (XPS) is employed to analyze the functionalized silicon wafers, while time-of-flight secondary ion mass spectrometry (ToF-SIMS) evidences the spatial control of the functionalization of the surface achieved by using a micropatterned shadow mask. Water contact angle measurements and optical inspection observing the behavior of a water droplet demonstrate the photoinduced change on wettability of the structured functionalized surfaces due to the reversible trans-to-cis isomerization of the azobenzene moities.

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