Get access

Micropattern Formation by Molecular Migration via UV-induced Dehydration of Block Copolymers

Authors

  • Kenji Okada,

    1. Department of Materials Science, Graduate School of Engineering, Osaka Prefecture University, Sakai, Osaka, Japan
    2. International Laboratory of Materials Science and Nanotechnology, Osaka Prefecture University, Sakai, Osaka, Japan
    Search for more papers by this author
  • Yasuaki Tokudome,

    1. Department of Materials Science, Graduate School of Engineering, Osaka Prefecture University, Sakai, Osaka, Japan
    2. International Laboratory of Materials Science and Nanotechnology, Osaka Prefecture University, Sakai, Osaka, Japan
    Search for more papers by this author
  • Rie Makiura,

    1. Nanoscience and Nanotechnology Research Center, Osaka Prefecture University, Sakai, Osaka, Japan
    2. International Laboratory of Materials Science and Nanotechnology, Osaka Prefecture University, Sakai, Osaka, Japan
    3. PRESTO, Japan Science and Technology Agency, Kawaguchi, Saitama, Japan
    Search for more papers by this author
  • Kristina Konstas,

    1. Division of Materials Science and Engineering, CSIRO, Victoria, Australia
    Search for more papers by this author
  • Luca Malfatti,

    1. Laboratorio di Scienza dei Materiali e Nanotecnologie (LMNT), CR-INSTM, Universita di Sassari Palazzo Pou Salit., Alghero, SS, Italy
    2. International Laboratory of Materials Science and Nanotechnology, Osaka Prefecture University, Sakai, Osaka, Japan
    Search for more papers by this author
  • Plinio Innocenzi,

    1. Laboratorio di Scienza dei Materiali e Nanotecnologie (LMNT), CR-INSTM, Universita di Sassari Palazzo Pou Salit., Alghero, SS, Italy
    2. International Laboratory of Materials Science and Nanotechnology, Osaka Prefecture University, Sakai, Osaka, Japan
    Search for more papers by this author
  • Hiroki Ogawa,

    1. Japan Synchrotron Radiation Research Institute, Sayo, Hyogo, Japan
    Search for more papers by this author
  • Toshiji Kanaya,

    1. Institute for Chemical Research, Kyoto University, Uji, Kyoto, Japan
    Search for more papers by this author
  • Paolo Falcaro,

    1. Division of Materials Science and Engineering, CSIRO, Victoria, Australia
    2. International Laboratory of Materials Science and Nanotechnology, Osaka Prefecture University, Sakai, Osaka, Japan
    Search for more papers by this author
  • Masahide Takahashi

    Corresponding author
    1. Department of Materials Science, Graduate School of Engineering, Osaka Prefecture University, Sakai, Osaka, Japan
    2. International Laboratory of Materials Science and Nanotechnology, Osaka Prefecture University, Sakai, Osaka, Japan
    Search for more papers by this author

Abstract

A novel UV lithographic technique for the patterning of the block copolymer (Pluronic) thin films is developed. The present method is based on UV-induced water affinity changes in block copolymer films. By water vapor post-treatment of the film, a difference in water content is established between UV illuminated and unilluminated sections, which can induce an osmotic pressure at the interface. This osmotic pressure drives the migration of Pluronic molecules, resulting in formation of patterns on the block copolymer films. Remarkably, this patterning method requires neither initiators nor polymerizable moieties which are essential for a conventional photolithographic approach. Additionally, the etching process is bypassed, eliminating the use of destructive acids or organic solvents and making this an environmentally friendly patterning protocol. It is reported that Pluronic is photo-responsive to UV exposure, which causes the dehydration of the PEO-PPO-PEO backbone.

Ancillary