Atomic Layer Deposition Assisted Pattern Multiplication of Block Copolymer Lithography for 5 nm Scale Nanopatterning
Article first published online: 4 APR 2014
© 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Advanced Functional Materials
Volume 24, Issue 27, pages 4343–4348, July 16, 2014
How to Cite
Moon, H.-S., Kim, J. Y., Jin, H. M., Lee, W. J., Choi, H. J., Mun, J. H., Choi, Y. J., Cha, S. K., Kwon, S. H. and Kim, S. O. (2014), Atomic Layer Deposition Assisted Pattern Multiplication of Block Copolymer Lithography for 5 nm Scale Nanopatterning. Adv. Funct. Mater., 24: 4343–4348. doi: 10.1002/adfm.201304248
- Issue published online: 14 JUL 2014
- Article first published online: 4 APR 2014
- Manuscript Revised: 26 JAN 2014
- Manuscript Received: 20 DEC 2013
- Ministry of Science, ICT & Future Planning
Options for accessing this content:
- If you are a society or association member and require assistance with obtaining online access instructions please contact our Journal Customer Services team.
- If your institution does not currently subscribe to this content, please recommend the title to your librarian.
- Login via other institutional login options http://onlinelibrary.wiley.com/login-options.
- You can purchase online access to this Article for a 24-hour period (price varies by title)
- If you already have a Wiley Online Library or Wiley InterScience user account: login above and proceed to purchase the article.
- New Users: Please register, then proceed to purchase the article.
Login via OpenAthens
Search for your institution's name below to login via Shibboleth.
Registered Users please login:
- Access your saved publications, articles and searches
- Manage your email alerts, orders and subscriptions
- Change your contact information, including your password
Please register to:
- Save publications, articles and searches
- Get email alerts
- Get all the benefits mentioned below!