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Keywords:

  • force sensors;
  • spacer lithography;
  • phase-shift lithography;
  • nanodevices;
  • particle trackers
Thumbnail image of graphical abstract

Force position arrays which are able to track the position of micro- or nanometer-sized objects require an extremely high spatial resolution down to the nanometer range. On page 191, Kittitat Subannajui, Andreas Menzel, Margit Zacharias, and co-workers report methods which combine advanced lithographic processes and piezoelectric materials on a large scale. The structures are achieved by phaseshift lithography and atomic-layer-deposition-based spacer lithography.