Electrodeposition of Inorganic/Organic Hybrid Thin Films (pages 17–43)
Tsukasa Yoshida, Jingbo Zhang, Daisuke Komatsu, Seiichi Sawatani, Hideki Minoura, Thierry Pauporté, Daniel Lincot, Torsten Oekermann, Derck Schlettwein, Hirokazu Tada, Dieter Wöhrle, Kazumasa Funabiki, Masaki Matsui, Hidetoshi Miura and Hisao Yanagi
Article first published online: 4 DEC 2008 | DOI: 10.1002/adfm.200700188
The state of the art in hybrid thin-film technology is discussed, with emphasis on the electrodeposition and self-assembly from mixed solutions, and use of inorganic/organic thin films. To be widely applicable on an industrial level and to compete with Si-based systems, a full understanding of the chemical processes at play between all ionic and molecular species present in solution must be established. Significant inroads to this end have been made by the authors, but challenges yet remain for researchers in the field.