SEARCH

SEARCH BY CITATION

Plasma-enhanced CVD has been used, together with a new titanium precursor (see Figure), for the deposition of epiaxed (100) SrTiO3 thin films at a growth temperature of 500 ° C. In technical applications (100) SrTiO3 thin films have been found to be the ideal substrate for the growth “1-2-3-” superconductors due to the perfect lattice match. The new precursor is easy to synthesize handle, and is stable against air and moisture.