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Growth of cubic (100) SrTiO3 thin films by plasma-enhanced chemical vapor deposition using a novel titanium precursor

Authors

  • Dr. Helga Holzschuh,

    Corresponding author
    1. Institute of Organic Chemistry, University of Tübingen Auf der Morgenstelle 18, W-7400 Tübingen (FRG)
    • Institute of Organic Chemistry, University of Tübingen Auf der Morgenstelle 18, W-7400 Tübingen (FRG)
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  • Prof. Harald Suhr

    1. Institute of Organic Chemistry, University of Tübingen Auf der Morgenstelle 18, W-7400 Tübingen (FRG)
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  • This work has been supported by the Bundesministerium für Forschung und Technologie under grant 13N56750. We thank Dr. Demny, ABB Heidelberg, for WDX spectra and Mrs. Niquet, University of Tübingen, for XRD spectra. [AM C 142]

Abstract

Plasma-enhanced CVD has been used, together with a new titanium precursor (see Figure), for the deposition of epiaxed (100) SrTiO3 thin films at a growth temperature of 500 ° C. In technical applications (100) SrTiO3 thin films have been found to be the ideal substrate for the growth “1-2-3-” superconductors due to the perfect lattice match. The new precursor is easy to synthesize handle, and is stable against air and moisture.

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