Deposition of thin films of Zirconium and Hafnium Boride by plasma enhanced chemical vapor deposition

Authors

  • Silvia Reich,

    1. Department of Organic Chemistry, University of Tübingen Auf der Morgenstelle 18, W-7400 Tübingen (FRG)
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  • Prof. Harald Suhr,

    Corresponding author
    1. Department of Organic Chemistry, University of Tübingen Auf der Morgenstelle 18, W-7400 Tübingen (FRG)
    • Department of Organic Chemistry, University of Tübingen Auf der Morgenstelle 18, W-7400 Tübingen (FRG)
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  • Klára Hankó,

    1. Department of General and Inorganic Chemistry, Eötvös University P.O. Box 32, H-1518 Budapest 112 (Hungary)
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  • Prof. László Szepes

    1. Department of General and Inorganic Chemistry, Eötvös University P.O. Box 32, H-1518 Budapest 112 (Hungary)
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  • This work has been supported by the Bundesministerium für Forschunf und Technologie (Grant 13 N 5792 0). Mr. F. Koch (VST, Schopfheim) and ( Dr. C. Täschner (Institut für Festkörpehysik und Werkstofftechnik Dresden) are acknowledged for some analytical investigations.

Abstract

The technological importance of metal borides is based on their extreme ardness, high melting points, high conductivity, and chemical inertness and durability. The borohydrides of zirconium and hafnium are shown to be excellent precursors for the deposition of boride thin films, their volatility enabling fast deposition rates to be obtained. The high hardness of the boronrich, plasma CVD deposited films makes them ideal for applications as wear-protective coatings.

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