We would like to thank our colleagues B. Haas, E. Kähn, W Lunz, R. Schulte, K. Schwämlein and B. Stapp for their preparation work and technical assistance. We would also like to acknowledge the supply of photoactive compounds by Hoechst.
The Top-CARL, process: A patterning technique for organic materials†
Article first published online: 15 SEP 2004
Copyright © 1992 Verlag GmbH & Co. KGaA, Weinheim
Volume 4, Issue 11, pages 753–756, November 1992
How to Cite
Leuschner, R., Ahne, H., Hammerschmidt, A., Kolodziej, G., Nordmann, J., Schmidt, E., Sebald, M. and Sezi, R. (1992), The Top-CARL, process: A patterning technique for organic materials. Adv. Mater., 4: 753–756. doi: 10.1002/adma.19920041112
- Issue published online: 15 SEP 2004
- Article first published online: 15 SEP 2004
The patterning of organic layer materials is often hindered by the effects of the conditions used to “develop” the resist material, for example high temperatures for strong bases, which attack the substrate. The process described here allows the patterning even of delicate layers of oriented nonlinear optical polymers. The figure shown a patterned polyimide film 115 μm thick.