Advanced Materials

High-Tc superconducting thin films

Authors

  • Dr. Shintaro Miyazawa,

    Corresponding author
    1. NTT LSI Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi Kanagawa 243-01 (Japan)
    • NTT LSI Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi Kanagawa 243-01 (Japan)
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    • received his B.S. and M.S. degrees in metallurgical engineering from Waseda University in 1966 and 1968, respectively, and a Ph.D. in electronic engineering from Tohoku University in 1978. Since joining NTT, he has been engaged in research on optical single crystals and compound semiconductors. Since 1987 he has been involved with new materials for high-Tc superconducting thin films. He is a Research Fellow at the NTT LSI Laboratories.

  • Dr. Yasuo Tazoh,

    Corresponding author
    1. NTT LSI Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi Kanagawa 243-01 (Japan)
    • NTT LSI Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi Kanagawa 243-01 (Japan)
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    • received a B.S. degree in electrical engineering from Kagoshima University in 1976, and an M.S. degree and a Ph.D., also in electrical engineering, from Kyushu University in 1978 and 1986, respectively. Since joining NTT, he has been involved in the research and development of weak-link Josephson junctions, packaging, and ultra-fast signal measurement technologies for the Josephson computer. He is currently Senior Research Engineer, Supervisor, in research on device applications of high-Tc superconducting thin films at the NTT LSI Laboratories.

  • Hidefumi Asano,

    Corresponding author
    1. NTT Interdisciplinary Research Laboratories 162, Shirakata Shirane, Tokai, Naka-gun Ibaraki 319-11 (Japan)
    • NTT Interdisciplinary Research Laboratories 162, Shirakata Shirane, Tokai, Naka-gun Ibaraki 319-11 (Japan)
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    • was awarded an M.E. degree by Nagoya University in 1981. Since joining NTT in the same year, he has been engaged in fabricating thin films and tunnel junctions of metallic and oxide superconductors. He is currently Senior Research Engineer of the high-Tc superconducting materials research group at the NTT Interdisciplinary Research Laboratories.

  • Dr. Yasuhiro Nagai,

    Corresponding author
    1. NTT Interdisciplinary Research Laboratories 162, Shirakata Shirane, Tokai, Naka-gun Ibaraki 319-11 (Japan)
    • NTT Interdisciplinary Research Laboratories 162, Shirakata Shirane, Tokai, Naka-gun Ibaraki 319-11 (Japan)
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    • received his B.E., M.E. and Ph.D. degrees from Keio University in 1979, 1981, and 1988, respectively. Since joining NTT in 1981, his research has dealt with thin-film head devices and high-Tc superconducting devices. He is currently Senior Research Engineer at the NTT Interdisciplinary Research Laboratories.

  • Dr. Osamu Michikami,

    Corresponding author
    1. NTT Interdisciplinary Research Laboratories 162, Shirakata Shirane, Tokai, Naka-gun Ibaraki 319-11 (Japan)
    • NTT Interdisciplinary Research Laboratories 162, Shirakata Shirane, Tokai, Naka-gun Ibaraki 319-11 (Japan)
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    • received his M.S. and Ph.D. degrees from Tohoku University in 1969 and 1981, respectively. Since joining NTT in 1969, he has been active in research on contact materials for speech pass switches, and now high-Tc oxide thin films and their applications. He is currently Leader of the superconducting device research group at the in NTT Interdisciplinary Research Laboratories.

  • Dr. Minoru Suzuki

    Corresponding author
    1. NTT Interdisciplinary Research Laboratories 162, Shirakata Shirane, Tokai, Naka-gun Ibaraki 319-11 (Japan)
    • NTT Interdisciplinary Research Laboratories 162, Shirakata Shirane, Tokai, Naka-gun Ibaraki 319-11 (Japan)
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    • was awarded M.E. and D.E. degrees by Kyoto University in 1975 and 1985, respectively. While at NTT, he has been active in the areas of conducting metal oxides and superconducting materials. He is currently Group Leader of the high-Tc superconducting materials research group.


  • The following colleagues have contributed to the results contained in this article : M. Asahi, J. Kobayashi, S. Kubo, M. Mukaida, M. Sasaura and N. Suzuki.

Abstract

This review describes recent advances in thin film studies of high-Tc superconducting cuprates. Emphasis is placed on epitaxial thin film growth technologies for LnBa2Cu3Ox (Ln = Y, Eu) cuprates, and on microwave device applications. An exciting area of this research involves epitaxial multilayer structures, such as a superconductor/insulator/superconductor (SIS) combination, and so preliminary results on SIS fabrication are also described.

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