The use of photolithography of produce 3 nm features sounds like a pipe dream. But is it? The circuit size achievable with X-ray lithography cannot be pushed below 0.25 μm due to limiting lens technology. Now it has been shown that the genetic material DNA can be used to form micro-photomasks with features 100 times smaller than those on current silicon chips. The construction of nucleic and networks, their conversion into electron-conducting networks, and their use in photolithography are described.