DNA technology in chip construction

Authors

  • Prof. Ernesto Di Mauro,

    Corresponding author
    1. Dipartimento di Genetica e Biologia Molecolare, Università Sapienza Piazzale Aldo Moro, 5, Roma (Italy)
    • Dipartimento di Genetica e Biologia Molecolare, Universitá Sapienza Piazzale Aldo Moro, 5, Roma (Italy)
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  • Prof. Cornelis P. Hollenberg

    1. Institut für Mikrobiologie, Heinrich-Heine Universität Universitätsstrasse 1, W-4000 Düsseldorf 1 (FRG)
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Abstract

The use of photolithography of produce 3 nm features sounds like a pipe dream. But is it? The circuit size achievable with X-ray lithography cannot be pushed below 0.25 μm due to limiting lens technology. Now it has been shown that the genetic material DNA can be used to form micro-photomasks with features 100 times smaller than those on current silicon chips. The construction of nucleic and networks, their conversion into electron-conducting networks, and their use in photolithography are described.

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