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Plasma induced chemical vapor deposition of Zr(C,B) from CpZr(BH4)3 (Cp [DOUBLE BOND] C5H5⊖)

Authors

  • Dr. Silvia Reich,

    1. University of Tübingen, Institute of Organic Chemistry Auf der Morgenstelle 18, D-72076 Tübingen (FRG)
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  • Dr. Johannes Messelhäuser,

    Corresponding author
    1. University of Tübingen, Institute of Organic Chemistry Auf der Morgenstelle 18, D-72076 Tübingen (FRG)
    Current affiliation:
    1. Plasonic Oberflächen GmbH, Carl-Zeiss-Strasse 9, D-70839 Gerlingen (FRG)
    • University of Tübingen, Institute of Organic Chemistry Auf der Morgenstelle 18, D-72076 Tübingen (FRG)
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  • Prof. Harald Suhr,

    1. University of Tübingen, Institute of Organic Chemistry Auf der Morgenstelle 18, D-72076 Tübingen (FRG)
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  • Prof. Gerhard Erker,

    1. University of Münster, Institute of Organic Chemistry Corrensstrasse 40, D-48149 Münster (FRG)
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  • Cornelia Fritze

    1. University of Münster, Institute of Organic Chemistry Corrensstrasse 40, D-48149 Münster (FRG)
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  • This work is part of the thesis of S. Reich. It was supported by the German Ministerium für Forschung und Technologie (Grant 13 N 5792).

Abstract

The hardness of metal borides makes them suitable for applications as corrosion resistant and, in combination with other materials, as hard coatngs for cutting tools, for example. The plasma induced chemical vapor deposition of Zr(C,B) from the precursor CpZr(BH4)3, where Cp is C5H5⊖, is described and the results of an investigation of the dependence of the deposition rete and the film characteristics on the deposition parameters, e.g. the carrier gas and the substrate temperature, are presented.

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