Aerosol-assisted chemical vapor deposition (AACVD) of silver, palladium and metal alloy (Ag1−xPdx, Ag1−xCux and Pd1−xCux) Films

Authors

  • Dr. Chongying Xu,

    1. Departments of Chemistry and Chemical Engineering University of New Mexico Albuquerque, NM 87131 (USA)
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  • Prof. Mark J. Hampden-Smith,

    Corresponding author
    1. Departments of Chemistry and Chemical Engineering University of New Mexico Albuquerque, NM 87131 (USA)
    • Departments of Chemistry and Chemical Engineering University of New Mexico Albuquerque, NM 87131 (USA)
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  • Prof. Toivo T. Kodas

    Corresponding author
    1. Departments of Chemistry and Chemical Engineering University of New Mexico Albuquerque, NM 87131 (USA)
    • Departments of Chemistry and Chemical Engineering University of New Mexico Albuquerque, NM 87131 (USA)
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  • M. H.-S. and T. T. K. thank the NSF (# CHE-9107035) for funding this work, Dr. Bill Wallace of the Advanced Materials Laboratory for measuring the XPS data and Mr. Tom Corbitt for collecting the SEM data. M. H.-S. thanks the NSF chemical instrumentation program for purchase of a low-field NMR spectrometer and AFOSR and the Dreyfus foundation for the purchase of a X-ray powder diffractometer.

Abstract

Thermally labile, low-volatility molecules are usually unsuitable as precursors for the chemical vapor deposition of high-quality metal films. Here, a new method, aerosol-assisted CVD (see Fig.), is reported, and used to produce crystalline silver, palladium, and binary metal alloy thin films from just such precursors.

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