Promising new precursors for the CVD of gold

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Abstract

High deposition rates for the CVD of gold at low temperatures are reported. The synthesis and use of methyl(alkyldimethoxyphosphine)gold(I) compounds in the chemical vapor deposition of gold (see Figure) is described, and the precursors are found to be easily handled in air, and to result in comparable deposition rates and higher yields compared to currently used materials.

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