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Chemical vapor deposition (CVD) is an important technique used to produce thin films of a wide variety of materials. It finds applications, for example, in the semiconductor industry in the production of chips, and is used to deposit6 ceramics, metals, semiconductors, and even organics. Towards the back of this issue a new section devoted exclusively to CVD and related technologies appears. every two months a similar section will be included in AM. The Essay describes the new section and our plans for its development.