Advanced Materials

Optical characterization of amorphous dielectric films

Authors

  • Dr. Adele Sassella

    Corresponding author
    1. Istituto Nazionale per la Fisica della Materia and Dipartimento di Fisica Università degli Studi di Milano via Celoria 16, I-20113 Milano
    • Istituto Nazionale per la Fisica della Materia and Dipartimento di Fisica Università degli Studi di Milano via Celoria 16, I-20113 Milano
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  • The author is grateful to A. Borghesi for his kind collaboration and useful suggestions and to M. Moscardini for technical assistance.

Abstract

Dielectric thin films find technological applications in microelectronics and optoelectronics, for example, which makes it important to be able to characterize their electrical and optical properties easily. Two techniques available for the optical characterization—transmittance measurements and spectroscopic ellipsometry—are considered here and examples presented for the characterization of silicon oxide, nitride, and oxynitride films in the IR and UV-vis regions by these methods.

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