Patterning of poly(3-octylthiophene) conducting polymer films by electron beam exposure

Authors

  • Dr. S. H. Magnus Persson,

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    1. Department of Physics Chalmers University of Technology S-412 96 Göteborg (Sweden)
    • Department of Physics Chalmers University of Technology S-412 96 Göteborg (Sweden)
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  • Dr. Peter Dyreklev,

    1. Laboratory of Applied Physics Department of Physics, Linköping University S-581 83 Linköping (Sweden)
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  • Dr. Olle Inganäs

    1. Laboratory of Applied Physics Department of Physics, Linköping University S-581 83 Linköping (Sweden)
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  • We acknowledge Mats Andersson and Neste Oy for synthesis of the conducting polymers. We used the Swedish Nanometer Laboratory for electron beam lithography. This work was supported by the Swedish Board of Technical and Industrial Development (NUTEK) through the Micronics program and the Swedish Research Council for Engineering Sciences.

Abstract

Accurate patterning of a conducting polymer using electron beam lithography has been demonstrated for poly(3-octylthiophene) for line widths down to 50 nm. It also proved possible to attach very closely spaced gold electrodes, with separations down to tens of nanometers, enabling the measurement of the electron transport properties of small strips consisting of a limited number of conducting polymer chains. Information gained from these experiments will be useful in molecular electronics and possibly for single electron devices.

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