We acknowledge Mats Andersson and Neste Oy for synthesis of the conducting polymers. We used the Swedish Nanometer Laboratory for electron beam lithography. This work was supported by the Swedish Board of Technical and Industrial Development (NUTEK) through the Micronics program and the Swedish Research Council for Engineering Sciences.
Patterning of poly(3-octylthiophene) conducting polymer films by electron beam exposure†
Article first published online: 29 OCT 2004
Copyright © 1996 Verlag GmbH & Co. KGaA, Weinheim
Volume 8, Issue 5, pages 405–408, May 1996
How to Cite
Persson, S. H. M., Dyreklev, P. and Inganäs, O. (1996), Patterning of poly(3-octylthiophene) conducting polymer films by electron beam exposure. Adv. Mater., 8: 405–408. doi: 10.1002/adma.19960080506
- Issue published online: 29 OCT 2004
- Article first published online: 29 OCT 2004
- Manuscript Revised: 12 JAN 1996
- Manuscript Received: 2 NOV 1995
Accurate patterning of a conducting polymer using electron beam lithography has been demonstrated for poly(3-octylthiophene) for line widths down to 50 nm. It also proved possible to attach very closely spaced gold electrodes, with separations down to tens of nanometers, enabling the measurement of the electron transport properties of small strips consisting of a limited number of conducting polymer chains. Information gained from these experiments will be useful in molecular electronics and possibly for single electron devices.