This work was supported in part by ONR and ARPA. This work made use of MRSEC shared Facilities supported by NSF (DMR-9400396). The SIMS analysis was carried out by Judy Baker at the center for Microanalysis of Materials, University of Illinois at Urbana-Champaign, which is supported by the U. S. Department of Energy under grant DEFG02-91-ER45439.
Shadowed sputtering of gold on V -shaped microtrenches etched in silicon and applications in microfabrication†
Article first published online: 29 OCT 2004
Copyright © 1996 Verlag GmbH & Co. KGaA, Weinheim
Volume 8, Issue 9, pages 765–768, September 1996
How to Cite
Xia, Y. and Whitesides, G. M. (1996), Shadowed sputtering of gold on V -shaped microtrenches etched in silicon and applications in microfabrication. Adv. Mater., 8: 765–768. doi: 10.1002/adma.19960080915
- Issue published online: 29 OCT 2004
- Article first published online: 29 OCT 2004
Silicon micromachining has a wide range of applications in, for example, microelectronics. Here, a combination of several techniques is used in modifying the surface properties of V-shaped microtrenches (see Figure) and for fabricating complex surface relief structures.