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Langmuir–Blodgett (LB) films for high-resolution resists for the preparation of integrated circuits with higher densities are reviewed briefly. A technique based on the polymerization of monomeric LB films and a newer one based on the two-dimensional cross-linking of a polymeric LB film are described. It is demonstrated that cross-linkable polymeric LB films have the ability to create high-resolution molecular patterning with nanometer (layer) thickness. Examples of patterns produced with such films are presented.