This research was financed by the Office of Naval Research. Useful discussions with Professors Lynn Fuller and Bruce Smith at the Rochester Institute of Technology as well as use of microlithographic facilities at the University of Rochester Institute of Optics are gratefully acknowledged. We also thank Jams Sheoits and Homer Antoniadis for help in device fabrication and numorous fruitful discussions. Fluorescent photomicroscopy courtesy of Lynn Spitz.
Microlithographic process for patterning conjugated emissive polymers†
Article first published online: 29 OCT 2004
Copyright © 1997 Verlag GmbH & Co. KGaA, Weinheim
Volume 9, Issue 5, pages 392–395, Mai 1997
How to Cite
Renak, M. L., Bazan, G. C. and Roitman, D. (1997), Microlithographic process for patterning conjugated emissive polymers. Adv. Mater., 9: 392–395. doi: 10.1002/adma.19970090505
- Issue published online: 29 OCT 2004
- Article first published online: 29 OCT 2004
- Manuscript Received: 22 OCT 1996
The spatially confined synthesis of emissive conjugated polymers—compatible with existing 1C fabrication technology—is described, which can be used to create well-defined micrometerscale patterned organic LEDs (see cover). The Figure shows the first step in the photolithographic process, which is followed by irradication, to produce a latent image, and development, resulting in patterned polymer.