Imaging polymers with supercritical carbon dioxide


  • The authors thank SRC for partial support of this work. Narayan Sundararajan was instrumental in the completion of this manuscript. The use of the facilities of Phasex, the Cornell Materials Science Center, and the Cornell Nanofabrication Facility are acknowledged. Finally, the use of facilities at MIT Lincoln Laboratories and input from Dr. Rod Kunz are greatly appreciated.


In lithographic techniques for forming nanostructures in surface and polymer thin films, the selectivity of the solvent becomes increasingly important as the target dimensions decrease. Polymer-based developers. The Figure shows the SC CO2–developed image of a copolymer of pentafluoroproyl methacrylate and tert-butyl methacrylate.

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