A Combined Top–Down/Bottom–Up Approach to the Microscopic Localization of Metallic Nanodots

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Abstract

Periodic and aperiodic two-dimensional nanostructures with hierarchical order have been prepared by a combined top–down/bottom–up approach. This method allows 7 nm nanoparticles to be positioned with a accuracy of 10 nm or less, with a separation distance of several micrometers. The Figure is an optical dark field microscopy image of a square arrangement of Au dots on a Si wafer.

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