Benchtop Fabrication of Submicrometer Metal Line and Island Arrays Using Passivative Microcontact Printing and Electroless Plating

Authors


  • The authors gratefully acknowledge support of this work from the Army Research Office MURI Program, the National Science Foundation, the Robert A. Welch Foundation, the Air Force Office of Scientific Research, and the Texas Advanced Technology Program.

Abstract

An entirely benchtop method of fabricating long-range, planar arrays of discrete metal structures on glass or SiO2/Si surfaces without the use of e-beam or photolithography, resist masks, or chemical etching is reported. This approach combines microcontact printing and directed electroless plating for the controlled deposition of islands or lines of gold or silver. The Figure shows gold lines ca. 50 nm in height deposited on a pre-patterned glass surface.

Ancillary