Fabrication of Large-Area Periodic Nanopillar Arrays for Nanoimprint Lithography Using Polymer Colloid Masks


  • This research was supported in part by the National Science Council, Taiwan under contract no. 91-2113-M-001-021.


Large-area, well-ordered, periodic nanopillar arrays (see Figure) can be fabricated using a combination of double-layer nanosphere lithography and reactive ion etching. The nanopillar arrays fabricated by this method can, in turn, be used as the stamps for nanoimprint lithography. The results presented indicate that this approach can be used to produce large-area sub-50 nm periodic nanostructures.