We thank H. Grimm and M. Hampel (IBM Mainz, Germany) for their support with magnetic characterization of our samples. We thank B. D. Terris (IBM Almaden Research Center, San Jose, CA, USA), who inspired us to start this work, supported us during the project, and helped us by growing the Co/Pt ML samples used in this work, as well as Z. Z. Bandic (IBM Almaden Research Center) for providing us GDS files defining the mask structures, and J. E. E. Baglin (IBM Almaden Research Center) for very valuable discussions regarding the various ion-irradiation effects. We thank D. Adam, H. Eichhorn, O. Fortagne (Leica Microsystems, Jena, Germany), and R. Springer (IMS Stuttgart, Germany) for their support regarding critical steps of the stencil-mask fabrication, in particular the e-beam lithography. This work was supported in part by the German Ministry of Education and Research (BMBF) under grant number 13N7837.
Nanopatterning of Magnetic Disks by Single-Step Ar+ Ion Projection†
Article first published online: 21 JUL 2003
Copyright © 2003 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 15, Issue 14, pages 1152–1155, July, 2003
How to Cite
Dietzel, A., Berger, R., Loeschner, H., Platzgummer, E., Stengl, G., Bruenger, W.H. and Letzkus, F. (2003), Nanopatterning of Magnetic Disks by Single-Step Ar+ Ion Projection. Adv. Mater., 15: 1152–1155. doi: 10.1002/adma.200304943
- Issue published online: 21 JUL 2003
- Article first published online: 21 JUL 2003
- Manuscript Accepted: 4 APR 2003
- Manuscript Received: 4 FEB 2003
- Data storage;
- Ion projection;
- Magnetic materials;
Large-area Ar+ projection has been used to generate planar magnetic nanostructures on a 1″-format hard disk in a single step (see Figure). The recording pattern was transferred to a Co/Pt multilayer without resist processes or any other contact to the delicate media surface. It is conceivable that magnetic nanostructures can be replicated from a single stencil mask on large quantities of disks for future high-density recording.