Reduction of the dielectric constant k to the ultra low-k range is important for the continuing miniaturization of semiconductor devices. It is demonstrated that γ-cyclodextrin can act as an effective porogen (see Figure) to reduce k while maintaining good film strength. A continuous thin pure-silica zeolite MFI film with k = 1.8 and elastic modulus of 14 GPa is reported, prepared by spin-on from a zeolite nanoparticle suspension.
If you can't find a tool you're looking for, please click the link at the top of the page to "Go to old article view". Alternatively, view our Knowledge Base articles for additional help. Your feedback is important to us, so please let us know if you have comments or ideas for improvement.