Get access

Ultra-Low-k Pure-Silica Zeolite MFI Films Using Cyclodextrin as Porogen


  • This work was supported by Asahi Kasei, AMD, and UC-SMART. We thank M. Itkis and R. Haddon for help with AFM images.


Reduction of the dielectric constant k to the ultra low-k range is important for the continuing miniaturization of semiconductor devices. It is demonstrated that γ-cyclodextrin can act as an effective porogen (see Figure) to reduce k while maintaining good film strength. A continuous thin pure-silica zeolite MFI film with k = 1.8 and elastic modulus of 14 GPa is reported, prepared by spin-on from a zeolite nanoparticle suspension.

Get access to the full text of this article