The authors thank Sung K. Lee for the spin-coating, Dr. M. Reiche for fabrication of the master stamp, and Dr. R. Hillebrand and Dr. K. Nielsch for stimulating discussions.
Moiré Pattern Formation on Porous Alumina Arrays Using Nanoimprint Lithography†
Article first published online: 11 SEP 2003
Copyright © 2003 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 15, Issue 18, pages 1531–1534, September, 2003
How to Cite
Choi, J., Wehrspohn, R.B. and Gösele, U. (2003), Moiré Pattern Formation on Porous Alumina Arrays Using Nanoimprint Lithography. Adv. Mater., 15: 1531–1534. doi: 10.1002/adma.200305251
- Issue published online: 11 SEP 2003
- Article first published online: 11 SEP 2003
- Manuscript Accepted: 12 JUN 2003
- Manuscript Received: 14 APR 2003
- Lithography, nanoimprint;
- Moiré patterns;
Porous alumina arrays with various Moiré patterns (see Figure) are prepared by two-step nanoindentation with different rotation angles and subsequent anodization. The patterns on the porous alumina array are in good agreement with the theory of Moiré patterns in terms of the rotation angles. In addition, replicas of photoresist polymer with the Moiré pattern are successfully prepared.