Communication

Pyroelectricity in Highly Stressed Quasi-Amorphous Thin Films†

  1. V. Lyahovitskaya1,
  2. I. Zon1,
  3. Y. Feldman1,
  4. S.R. Cohen2,
  5. A.K. Tagantsev3,
  6. I. Lubomirsky

Article first published online: 6 NOV 2003

DOI: 10.1002/adma.200305346

Issue

Advanced Materials

Advanced Materials

Volume 15, Issue 21, pages 1826–1828, November, 2003

Additional Information

How to Cite

Lyahovitskaya, V., Zon, I., Feldman, Y., Cohen, S.R., Tagantsev, A.K. and Lubomirsky, I. (2003), Pyroelectricity in Highly Stressed Quasi-Amorphous Thin Films. Adv. Mater., 15: 1826–1828. doi: 10.1002/adma.200305346

Author Information

  1. 1

    Deptartment of Materials and Interfaces, Weizmann Institute of Science, Rehovot 76100, Israel

  2. 2

    Chemical Research Support Unit, Weizmann Institute of Science, Rehovot 76100, Israel

  3. 3

    Department of Material Science, Ecole Polytechnique Federale De Lausanne, CH-1015 Lausanne, Switzerland

  1. †

    The authors wish to acknowledge the Israel Science Foundation and US-Israel Binational Science Foundation for funding this research. I.Z. thanks the Israeli Ministry of the Immigrant Absorption for partial support. A.T. acknowledges support of INTAS project 01-0818. We express our deepest appreciation to Prof. Oscar M. Stafsudd of UCLA and to Prof. Darrell Schlom of Penn State University for very fruitful discussions.

Publication History

  1. Issue published online: 6 NOV 2003
  2. Article first published online: 6 NOV 2003
  3. Manuscript Accepted: 16 JUL 2003
  4. Manuscript Received: 6 MAY 2003

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