Direct Patterning of Protein- and Cell-Resistant Polymeric Monolayers and Microstructures

Authors


  • This research has been supported by NIH (NIH grant # HL60435) and NSF (through Bioprocess Engineering Research Center). AK is partially funded through a post graduate fellowship (PGS-B) from Natural Sciences and Engineering Research Council of Canada.

Abstract

A simple technique is introduced to pattern proteins and cells with precise control over the feature topography (see Figure, white bar indicates 20 μm). The technique uses a combination of a molding process and a novel poly(ethylene glycol) copolymer to form topographical features ranging from polymeric monolayers to microstructures via simple modifications to the fabrication process.

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