This work was supported in part by the Brain Korea 21 Project.
Pressure-Assisted Capillary Force Lithography†
Article first published online: 29 JAN 2004
Copyright © 2004 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 16, Issue 2, pages 176–179, January, 2004
How to Cite
Khang, D.-Y. and Lee, H. H. (2004), Pressure-Assisted Capillary Force Lithography. Adv. Mater., 16: 176–179. doi: 10.1002/adma.200305673
- Issue published online: 29 JAN 2004
- Article first published online: 29 JAN 2004
- Manuscript Accepted: 5 SEP 2003
- Manuscript Received: 10 JUL 2003
- Lithography, capillary force;
- Reactive ion etching (RIE)
Pressure-assisted capillary force lithography is introduced using a permeable fluoropolymer material as a mold. Slight pressing (∼ 2–3 bar), when combined with a newly developed experimental set-up, ensures conformal contact between the stiff fluoropolymer mold and the substrate. The stiff nature of the mold material makes it possible to pattern sub-100 nm features (see Figure and cover).