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Facile Photofabrication of Stable, Submicrometer-Wide, Electrically Conductive Patterns


  • The authors thank Dr. H. Goto of Harima Chemicals Inc. for providing the silver nanoparticles.


A fabrication method for submicrometer-wide electric conductive patterns using Ag nanoparticle/polymer composites on furan-functionalized substrates (see Figure) is reported. A 180 nm wide (full width at half maximum) photofabricated pattern has been achieved, well below the wavelength of incident light. After annealing at 200 °C for 40 min, the pattern worked as an electric wire with a resistivity of ∼8 × 10–4 Ω cm.

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