Communication

Additive-Driven Phase-Selective Chemistry in Block Copolymer Thin Films: The Convergence of Top–Down and Bottom–Up Approaches†

  1. P. Du1,
  2. M. Li1,
  3. K. Douki1,5,
  4. X. Li1,
  5. C. B. W. Garcia1,
  6. A. Jain1,
  7. D.-M. Smilgies2,
  8. L. J. Fetters3,
  9. S. M. Gruner4,
  10. U. Wiesner,
  11. C. K. Ober

Article first published online: 3 JUN 2004

DOI: 10.1002/adma.200306189

Issue

Advanced Materials

Advanced Materials

Volume 16, Issue 12, pages 953–957, June, 2004

Additional Information

How to Cite

Du, P., Li, M., Douki, K., Li, X., Garcia, C., Jain, A., Smilgies, D.-M., Fetters, L., Gruner, S., Wiesner, U. and Ober, C. (2004), Additive-Driven Phase-Selective Chemistry in Block Copolymer Thin Films: The Convergence of Top–Down and Bottom–Up Approaches. Advanced Materials, 16: 953–957. doi: 10.1002/adma.200306189

Author Information

  1. 1

    Department of Materials Science and Engineering, Cornell University, Bard Hall, Ithaca, NY 14853, USA

  2. 2

    Cornell High Energy Synchrotron Source (CHESS), Cornell University Ithaca, NY 14853, USA

  3. 3

    Department of Chemical and Biomolecular Engineering, Cornell University, Olin Hall, Ithaca, NY 14853, USA

  4. 4

    Department of Physics, Cornell University, Clark Hall, Ithaca, NY 14853, USA

  5. 5

    Present address: JSR Micro, Inc., Sunnyvale, CA 94089, USA.

  1. †

    We gratefully thank Dr. Kathryn W. Guarini and Dr. Charles T. Black for helpful discussions, Dr. Jochen S. Gutmann for stimulating discussions about GISAXS data collection and interpretation and Dr. Ernest Fontes for his help with the CHESS experimental setup and support. The financial support by the Cornell Center for Materials Research (CCMR), a Materials Research Science and Engineering Center of the National Science Foundation (DMR-0079992), the NSF-funded Cornell NIRT (ECS-0103297-NIRT), the National Science Foundation (Grants DMR-0072009 and DMR-0072009), the IBM Faculty Partnership Program, and JSR Corporation is acknowledged. CHESS is a national user facility supported by NSF/NIH-NIGMH grant DMR-9713424. This work was supported in part by the Nanobiotechnology Center (NBTC), an STC Program of the National Science Foundation under Agreement No. ECS-9876771.

Publication History

  1. Issue published online: 29 JUN 2004
  2. Article first published online: 3 JUN 2004
  3. Manuscript Accepted: 2 FEB 2004
  4. Manuscript Received: 17 SEP 2003

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Keywords:

  • Block copolymers;
  • Lithography;
  • Thin films

Several strategies are demonstrated for the use of additive-driven chemistries that take place in only one type of the nanosized domains of all-organic and organic–inorganic hybrid block copolymer thin films. Such an approach is used to examine the convergence of “top–down” and “bottom–up” fabrication via light-driven processes. Characterization is carried out with microscopies and grazing-incidence small-angle X-ray scattering (see Figure and cover).

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